2022

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Influence of repetition rate on the growth of MgO thin film by pulsed laser deposition technique
(UMT, Lahore, 2022) TAHIR SAJJAD BUTT
The thin films of Magnesium Oxide (MgO) were fabricated onto a substrate of Si (100) by pulsed laser deposition (PLD) of the MgO target with varied repetition rates of 2, 3, 4, and 5 kHz respectively. Nd: YAG laser with a fundamental wavelength of 1064 nm was applied as an energy source with pulse energy of 100 mJ and vacuum as the background environment. The X ray Diffraction (XRD) revealed that the preferred orientation of thin films would be altered from (220) to (311) by increasing thickness. Crystallite sizes were decreased from 65 to 15 nm with an increasing thickness of 307 to 960 nm. It was observed that grain size and film thickness increase with an increase in repetition rate (number of laser shots) while the crystallite size decreases as the repetition rate increases. The surface structure and topology of thin films were analyzed by applying a Scanning Electron Microscope (SEM) which demonstrated that there was no presence of cracks and the film was highly smooth. Such films were suitable as buffer layers for the growing high-quality ferroelectric and superconducting over layers